Characterization of polymer layer formation during SiO...

Japanese Journal of Applied Physics 2014 / 01 Vol. 53; Iss. 3S2

Characterization of polymer layer formation during SiO 2 /SiN etching by fluoro/hydrofluorocarbon plasmas

Miyake, Keita, Ito, Tomoko, Isobe, Michiro, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.03DD02
Date:
January, 2014
File:
PDF, 190 KB
english, 2014
Conversion to is in progress
Conversion to is failed