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Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films
Yong-Sheng, Chen, Shi-E, Yang, Jian-Hua, Wang, Jing-Xiao, Lu, Xiao-Yong, Gao, Jin-Hua, Gu, Wen, Zheng, Shang-Li, ZhaoVolume:
17
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/17/4/040
Date:
April, 2008
File:
PDF, 190 KB
english, 2008