SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Advanced self-aligned double patterning development for sub-30-nm DRAM manufacturing
Shiu, Weicheng, Liu, Hung Jen, Wu, Jan Shiun, Tseng, Tsu-Li, Liao, Chun Te, Liao, Chien Mao, Liu, Jerry, Wang, Troy, Levinson, Harry J., Dusa, Mircea V.Volume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.813986
File:
PDF, 817 KB
english, 2009