Recovery from Plasma-Process-Induced Damage in Porous...

Japanese Journal of Applied Physics 2006 / 8 Vol. 45; Iss. 8A

Recovery from Plasma-Process-Induced Damage in Porous Silica Low- k Films by Organosiloxane Vapor Annealing

Ono, Tetsuo, Kinoshita, Keizo, Takahashi, Hideki, Fujii, Nobutoshi, Sonoda, Yuzuru, Oku, Yoshiaki, Kohmura, Kazuo, Yagi, Ryotaro, Hata, Nobuhiro, Kikkawa, Takamaro
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.45.6231
Date:
August, 2006
File:
PDF, 302 KB
english, 2006
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