![](/img/cover-not-exists.png)
Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source
Matsuo, Seitaro, Adachi, YoshioVolume:
21
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.21.l4
Date:
January, 1982
File:
PDF, 478 KB
english, 1982