Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

Japanese Journal of Applied Physics 1982 / 1 Vol. 21; Iss. Part 2, No

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

Matsuo, Seitaro, Adachi, Yoshio
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Volume:
21
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.21.l4
Date:
January, 1982
File:
PDF, 478 KB
english, 1982
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