Plasma-Enhanced Atomic Layer Deposition of Cobalt Using...

Japanese Journal of Applied Physics 2010 / 5 Vol. 49; Iss. 5

Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

Kim, Jae-Min, Lee, Han-Bo-Ram, Lansalot, Clement, Dussarrat, Christian, Gatineau, Julien, Kim, Hyungjun
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.49.05fa10
Date:
May, 2010
File:
PDF, 268 KB
english, 2010
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