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Material Removal Mechanisms in Lapping and Polishing
C.J. Evans, E. Paul, D. Dornfeld, D.A. Lucca, G. Byrne, M. Tricard, F. Klocke, O. Dambon, B.A. MullanyVolume:
52
Year:
2003
Language:
english
Pages:
23
DOI:
10.1016/s0007-8506(07)60207-8
File:
PDF, 3.85 MB
english, 2003