Photothermal Investigation of Ti-Cu-N and Ti-Ni-N PVD Films

Photothermal Investigation of Ti-Cu-N and Ti-Ni-N PVD Films

H. Prekel, M.J. Klopfstein, M. Giesselbach, S. Patzelt, R. Ghisleni, D.A. Lucca, G. Goch, H.-R. Stock
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Volume:
55
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/s0007-8506(07)60488-0
File:
PDF, 148 KB
english, 2006
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