Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening
Chung, T-Y, Nest, D, Graves, D B, Weilnboeck, F, Bruce, R L, Oehrlein, G S, Wang, D, Li, M, Hudson, E AVolume:
43
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/43/27/272001
Date:
July, 2010
File:
PDF, 586 KB
english, 2010