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Effects of Pulsed Negative Bias and Current Density on Properties of N-Doped TiO2 Films Deposited by Arc Ion Plating
Zhang, Shu Juan, Li, Ming Sheng, Chen, Zhi Qin, Fan, Yong ZhongVolume:
476-478
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.476-478.2357
Date:
February, 2012
File:
PDF, 694 KB
english, 2012