Plasma Diagnostics and Characterizations of Al-Doped ZnO Films Deposited with Low Temperature Sputtering Process
Choi, Yoon S., Shim, Byeong C., Kim, Hye R., Han, Jeon G.Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.11NB02
Date:
November, 2013
File:
PDF, 603 KB
english, 2013