Simulations and Experiments on O Density and Distribution in Ashing Process Using Surface Plasma Excited by Microwave
Takagi, Shigeyuki, Yamazaki, Osamu, Yamauchi, Kenji, Shinmura, TadashiVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.086502
Date:
August, 2013
File:
PDF, 303 KB
english, 2013