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Nitrogen Incorporation Kinetics during the Sublimation Growth of 6H and 4H SiC
Onoue, Kozo, Nishikawa, Takeshi, Katsuno, Masakazu, Ohtani, Noboru, Yashiro, Hirokatsu, Kanaya, MasatoshiVolume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.2240
Date:
April, 1996
File:
PDF, 563 KB
1996