Effect of post-deposition annealing on the interfacial chemical bonding states and band alignment of atomic layer deposited neodymium oxide on silicon
Fan, Xiaojiao, Liu, Hongxia, Fei, ChenxiVolume:
1
Language:
english
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/1/4/045005
Date:
October, 2014
File:
PDF, 603 KB
english, 2014