Plasma enhanced chemical vapour deposition of hydrogenated...

Plasma Sources Science and Technology 2004 / 02 Vol. 13; Iss. 1

Plasma enhanced chemical vapour deposition of hydrogenated amorphous silicon at atmospheric pressure

Moravej, M, Babayan, S E, Nowling, G R, Yang, X, Hicks, R F
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Volume:
13
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/13/1/002
Date:
February, 2004
File:
PDF, 135 KB
english, 2004
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