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Nanoindentation study of a Cu/Ta/SiO 2 /Si multilayer system
Zhang, Xin, Lu, Qian, Wu, Zijing, Wu, Xiaojing, Shen, Weidian, Jiang, BinVolume:
33
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/33/4/043002
Date:
April, 2012
File:
PDF, 1.91 MB
english, 2012