Application of Zirconium Silicon Oxide Films to an...

Japanese Journal of Applied Physics 1999 / 12 Vol. 38; Iss. Part 1, No

Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography

Matsuo, Takahiro, Onodera, Toshio, Nakazawa, Keisuke, Ogawa, Tohru, Morimoto, Hiroaki, Haraguchi, Takashi, Fukuhara, Nobuhiko, Matsuo, Tadashi, Otaki, Masao, Takeuchi, Susumu
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.38.7004
Date:
December, 1999
File:
PDF, 107 KB
english, 1999
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