Thermal stability of HfO 2 /Si (001) films prepared by electron beam evaporation in ultrahigh vacuum using atomic oxygen
Xu, Run, Gong, Wei-Ming, Yan, Zhi-Jun, Wang, Lin-Jun, Xia, Yi-BenVolume:
19
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/19/12/128204
Date:
December, 2010
File:
PDF, 513 KB
english, 2010