An Atomic Scale Model of Multilayer Surface Reactions and...

Japanese Journal of Applied Physics 2005 / 12 Vol. 44; Iss. 12

An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching

Osano, Yugo, Ono, Kouichi
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.8650
Date:
December, 2005
File:
PDF, 1.11 MB
english, 2005
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