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Models and Simulations of the UV Lithography Process Based on Thick Photoresists
Zhou, Zai Fa, Huang, Qing An, Li, Wei HuaVolume:
201-203
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.201-203.75
Date:
February, 2011
File:
PDF, 326 KB
english, 2011