Annealing performance improvement of elongated inductively coupled plasma torch and its application to recovery of plasma-induced Si substrate damage
Okumura, Tomohiro, Eriguchi, Koji, Saitoh, Mitsuo, Kawaura, HiroshiVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.03DG01
Date:
January, 2014
File:
PDF, 189 KB
english, 2014