Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Different Power Densities
Wenfeng, Luo, Qibing, Sun, Cunxiao, Gao, Jie, Tang, Haojing, Wang, Wei, ZhaoVolume:
12
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/12/4/01
Date:
August, 2010
File:
PDF, 112 KB
english, 2010