Study of Temperature Behaviors for a Pellicle in...

Japanese Journal of Applied Physics 2013 / 12 Vol. 52; Iss. 12R

Study of Temperature Behaviors for a Pellicle in Extreme-Ultraviolet Lithography: Mesh Structure

Kim, In-Seon, Kim, Ji-Won, Oh, Hye-Keun
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.126506
Date:
December, 2013
File:
PDF, 522 KB
english, 2013
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