Reduction of RuO 2 Film to Metallic Ru Film Using Atomic Layer Deposition under Different Oxygen Partial Pressure
Park, Taeyong, Lee, Jaesang, Park, Jingyu, Jeon, Heeyoung, Jeon, HyeongtagVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.05FB05
Date:
May, 2013
File:
PDF, 1.07 MB
english, 2013