![](/img/cover-not-exists.png)
Void and Nanostructure Formations during Thermal Decomposition of 20-nm-Thick Silicon Oxide Layer on Si(100)
Enta, Yoshiharu, Ogawa, Kano, Nagai, TakayukiVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.031303
Date:
March, 2013
File:
PDF, 695 KB
english, 2013