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Effects of Processing Variables on Tantalum Nitride by Reactive-Ion-Assisted Magnetron Sputtering Deposition
Wei, Chao-Tsang, Shieh, Han-Ping D.Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.45.6405
Date:
August, 2006
File:
PDF, 531 KB
english, 2006