The effect of low frequency pulse-shaped substrate bias on...

Plasma Sources Science and Technology 2010 / 01 Vol. 19; Iss. 1

The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si : H thin films

Martin, I T, Wank, M A, Blauw, M A, van Swaaij, R A C M M, Kessels, W M M, van de Sanden, M C M
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Volume:
19
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/19/1/015012
Date:
January, 2010
File:
PDF, 569 KB
english, 2010
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