Impurities Induced Localized Corrosion Between Copper and Tantalum Nitride during Chemical Mechanical Planarization
Lin, Jeng-Yu, Wang, Yung-Yun, Wan, Chi-Chao, Feng, Hsien-Ping, Cheng, Min-YuanVolume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2364309
File:
PDF, 281 KB
english, 2007