Study of the Growth Mechanism of Nanocrystalline Si:H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon
Sun, Yong, Nishitani, Ryusuke, Miyasato, TatsuroVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.33.l1645
Date:
December, 1994
File:
PDF, 1.35 MB
english, 1994