Influences of different oxidants on the characteristics of HfAlO x films deposited by atomic layer deposition
Fan, Ji-Bin, Liu, Hong-Xia, Ma, Fei, Zhuo, Qing-Qing, Hao, YueVolume:
22
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/22/2/027702
Date:
February, 2013
File:
PDF, 360 KB
english, 2013