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Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning
Lee, Jae Uk, Hong, Seongchul, Ahn, JinhoVolume:
6
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.6.076502
Date:
July, 2013
File:
PDF, 562 KB
english, 2013