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Effects of the Process Variable on Sputtered TiSi[sub x] Polycide Gate Electrodes for sub-0.15 μm Memory Device Application
Kim, Sam-Dong, Hwang, In-Seok, Rhee, Jin-Koo, Suh, You-Seok, Park, Dae-GyuVolume:
148
Year:
2001
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1360209
File:
PDF, 383 KB
english, 2001