Silicon Mold Etching with Hard Mask Stack Using Spherical Structure of Block Copolymer for Bit-Patterned Media with 2.8 Tbit/in. 2
Kurihara, Masaru, Satake, Makoto, Nishida, Tetsuya, Tsuchiya, Yuko, Tada, Yasuhiko, Yoshida, Hiroshi, Negishi, NobuyukiVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.086201
Date:
August, 2013
File:
PDF, 648 KB
english, 2013