A technique for local area transfer and simultaneous crystallization of amorphous silicon layer with midair cavity by irradiation with near-infrared semiconductor diode laser
Sakaike, Kohei, Kobayashi, Yoshitaka, Nakamura, Shogo, Akazawa, Muneki, Higashi, SeiichiroVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.040303
Date:
April, 2014
File:
PDF, 659 KB
english, 2014