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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Thermal acid generator (TAG) synthesis variables and their effect on resist performance
Oberlander, Joseph E., Wanat, Stan F., McKenzie, Douglas S., Kokinda, Elaine, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388351
File:
PDF, 730 KB
english, 2000