Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.076502
Date:
July, 2014
File:
PDF, 1.03 MB
english, 2014