Mask characterization for double patterning lithography

Mask characterization for double patterning lithography

de Kruif, Robert
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Volume:
8
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3023078
Date:
January, 2009
File:
PDF, 950 KB
english, 2009
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