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Effects of Pretreatment on the Electronic Properties of Plasma Enhanced Chemical Vapor Deposition Hetero-Epitaxial Graphene Devices
Zhang, Lian-Chang, Shi, Zhi-Wen, Yang, Rong, Huang, JianVolume:
31
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/31/9/097301
Date:
September, 2014
File:
PDF, 289 KB
english, 2014