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Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15
Dogu, Timur, Aydin, Ebru, Boz, Nezahat, Murtezaoglu, Kirali, Dogu, GulsenVolume:
1
Language:
english
Journal:
International Journal of Chemical Reactor Engineering
DOI:
10.2202/1542-6580.1012
Date:
January, 2002
File:
PDF, 252 KB
english, 2002