SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Design and fabrication of customized illumination patterns for low-k1 lithography--a diffractive approach: II. Calcium fluoride controlled-angle diffusers
Poutous, Menelaos K., Himel, Marc D., Delaney, William F., Stack, Jared D., Kathman, Alan D., Fedor, Adam S., Hutchins, Robert E., Leonard, Jr., Jerry L., Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474543
File:
PDF, 195 KB
english, 2002