Fast patterning and dry-etch of SiN x...

Journal of Semiconductors 2009 / 06 Vol. 30; Iss. 6

Fast patterning and dry-etch of SiN x for high resolution nanoimprint templates

Zhen, Shu, Jing, Wan, Bingrui, Lu, Shenqi, Xie, Yifang, Chen, Xinping, Qu, Ran, Liu
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Volume:
30
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/30/6/066001
Date:
June, 2009
File:
PDF, 1.52 MB
english, 2009
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