Polysilicon Etchback Plasma Process Using HBr, Cl[sub 2],...

Polysilicon Etchback Plasma Process Using HBr, Cl[sub 2], and SF[sub 6] Gas Mixtures for Deep-Trench Isolation

Yeom, Geun-Young
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
139
Year:
1992
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2069260
File:
PDF, 1.10 MB
english, 1992
Conversion to is in progress
Conversion to is failed