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Interfacial and Electrical Characterization of Atomic-Layer-Deposited HfO[sub 2] Gate Dielectric on High Mobility Epitaxial GaAs/Ge Channel Substrates
Dalapati, G. K., Kumar, M. K., Chia, C. K., Gao, H., Wang, B. Z., Wong, A. S. W., Kumar, A., Chiam, S. Y., Pan, J. S., Chi, D. Z.Volume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3453935
File:
PDF, 1.50 MB
english, 2010