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ECS Transactions [ECS 219th ECS Meeting - Montreal, QC, Canada (May 1 - May 6, 2011)] - Process Engineering and Trap Distribution for Dielectric/Si Interfacial Layer in High-k Gated MOS Devices
Chang-Liao, Kuei-Shu, Fu, Chung-Hao, Lu, Chun-Chang, Chang, Yu-An, Hsu, Ya-Yin, Tsao, Che-Hao, Wang, Tien-Ko, Heh, Da-Wei, Li, Y.C., Tsai, Wen-Fa, Ai, Chi-Fong, Hou, Fu-Chung, Hsu, Yao-TungYear:
2011
Language:
english
DOI:
10.1149/1.3572274
File:
PDF, 975 KB
english, 2011