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A New Specimen for Measuring the Interfacial Toughness of Al-0.5%Cu Thin Film on Si Substrate
Jeon, Insu, Omiya, Masaki, Inoue, Hirotsugu, Kishimoto, Kikuo, Asahina, TadashiVolume:
297-300
Year:
2005
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.297-300.521
File:
PDF, 506 KB
english, 2005