Influence of Ionic Strength and pH-value on the Silicon Dioxide Polishing Behaviour of Slurries Based on Pure Silica Suspensions
Kuenzelmann, Ulrich, Estel, Kathrin, Bartha, Johann W, Meyer, Erwin-Peter, Barthel, HerbertVolume:
1249
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1249-E04-02
Date:
January, 2010
File:
PDF, 158 KB
english, 2010