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Time-resolved cavity ring-down spectroscopic study of the gas phase and surface loss rates of Si and SiH3 plasma radicals
J.P.M. Hoefnagels, A.A.E. Stevens, M.G.H. Boogaarts, W.M.M. Kessels, M.C.M. van de SandenVolume:
360
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0009-2614(02)00802-3
File:
PDF, 206 KB
english, 2002