![](/img/cover-not-exists.png)
Automatic Reaction Modeling in Chemical Vapor Depositions Using Multiple Process Simulators
Takahashi, Takahiro, Funatsu, Kimito, Ema, YoshinoriVolume:
804
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-804-JJ9.15
Date:
January, 2003
File:
PDF, 154 KB
english, 2003