Atomic Layer Deposition of Ruthenium Films on Hydrogen terminated Silicon
Park, Sun Kyung, Roodenko, K., Chabal, Yves J., Wielunski, L., Kanjolia, R., Anthis, J., Odedra, R., Boag, N.Volume:
1156
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1156-D04-02
Date:
January, 2009
File:
PDF, 333 KB
english, 2009