Effect of Deposition and Storage Conditions on the Gas Permeability of SiOx Thin Films
Toshiro, Kobayashi, Susumu, Kamikawa, Yoshifumi, Itou, Hideyuki, Kanematsu, Yuichi, UtsumiVolume:
378
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.378.248
Date:
August, 2013
File:
PDF, 274 KB
english, 2013